| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a member that is used for a CVD apparatus and a plasma treatment apparatus (plasma etching apparatus) in production of semiconductors, and has high corrosion resistance particularly to corrosive gas or plasma and high heat resistance. <P>SOLUTION: The member is a member on which a glass spraying film of corrosion-resistant glass containing at least one element selected from a group comprising elements of Group 2a, Group 3a and Group 4a, and particularly alumino-silicate or zirconia-silicate based glass is coated. The member has high corrosion resistance and heat resistance to corrosive gas or plasma, and includes few particles generated therein. <P>COPYRIGHT: (C)2004,JPO&NCIPI |
