发明名称 |
Illumination optical apparatus, exposure apparatus and method of exposure |
摘要 |
An exposure apparatus with optimum illumination conditions without dependence on the directionality of the fine pattern on a reticle comprises an illumination optical system for illuminating a reticle having a pattern to be transferred and a projection optical system for projecting and transforming the reticle pattern on a substrate. The illumination optical system has pupil shape forming unit for forming four substantially planar light sources on the plane in the vicinity of its pupil. These four substantially planar light sources are arranged at each substantial vertices of a narrow rectangle whose barycenter is located on the illumination optical axis.
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申请公布号 |
US2004174512(A1) |
申请公布日期 |
2004.09.09 |
申请号 |
US20040797132 |
申请日期 |
2004.03.11 |
申请人 |
NIKON CORPORATION |
发明人 |
TOYODA MITSUNORI;TANITSU OSAMU;TAKEUCHI YUICHIRO;HIRUKAWA SHIGERU;SUWA KYOICHI;NAKASHIMA TOSHIHARU |
分类号 |
H01L21/027;G03B27/54;G03F7/20;(IPC1-7):G03B27/54 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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