发明名称 |
Reflective mask blank having a programmed defect and method of producing the same, reflective mask having a programmed defect and method of producing the same, and substrate for use in producing the reflective mask blank or the reflective mask having a programmed defect |
摘要 |
A reflective mask blank has a substrate (1) and a reflective multilayer film (3) formed on the substrate to reflect exposure light. The substrate has a base pattern (2) formed by a predetermined irregularity. On a surface of the reflective multilayer film formed on the base pattern, a step portion corresponding to the base pattern is formed as a programmed defect. |
申请公布号 |
US2004175633(A1) |
申请公布日期 |
2004.09.09 |
申请号 |
US20040789990 |
申请日期 |
2004.03.02 |
申请人 |
HOYA CORPORATION |
发明人 |
SHOKI TSUTOMO;OHKUBO RYO;KINOSHITA TAKERU |
分类号 |
G21K1/06;C03C17/36;C03C23/00;C23C14/22;C23C14/46;G03F1/08;G03F1/14;G03F1/24;G03F1/38;G03F1/84;G21K5/00;G21K5/02;H01L21/027;(IPC1-7):B32B17/06;B32B9/00;G03F9/00 |
主分类号 |
G21K1/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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