发明名称 Process liquid supply nozzle, process liquid supply device and nozzle cleaning method
摘要 A process liquid supply nozzle comprises a substantially tubular main nozzle provided with a discharge port for discharging a coating liquid, a substantially bowl-shaped nozzle holder provided with a through-hole into which the main nozzle can be inserted, and a free space formed between the inner circumferential surface of the nozzle holder and the outer circumferential surface of the main nozzle, at least a prescribed cleaning liquid being supplied into the free space. The nozzle holder or the nozzle is relatively movable in the vertical direction such that the coating liquid is discharged from the discharge port under the state that the discharge port of the main nozzle projects downward from the through-hole, and the nozzle is cleaned with the cleaning liquid under the state that the nozzle is housed in the nozzle holder.
申请公布号 US2004173153(A1) 申请公布日期 2004.09.09
申请号 US20040784202 申请日期 2004.02.24
申请人 TOKYO ELECTRON LIMITED 发明人 MURAMATSU MAKOTO;HASHIMA HITOSHI;SASAGAWA NORIHIKO;HIRAO TAKESHI
分类号 H01L21/304;H01L21/00;(IPC1-7):C23C16/00 主分类号 H01L21/304
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