PRODUCTION METHOD FOR RADIATION-RESISTANT QUARTZ GLASS MATERIAL, AND QUARTZ GLASS MATERIAL

摘要

PROBLEM TO BE SOLVED: To provide a production method for quartz glass by which a quartz glass material whose optical properties does not change or changes little in long-term use can be formed.

SOLUTION: The production method produces a quartz glass material which exhibits high resistance to radiation-induced density change when irradiated with ultraviolet rays having a wavelength of around 193 nm and an energy density almost the same as the processing energy density of an optical system for microlithography. The method minimizes the amount of peroxo-group defects in the quartz glass material and suppresses the generation of closely adjacent hydroxy groups, i.e. an essential cause of radiation-induced density decrease.

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