PREDICTION METHOD, EVALUATION METHOD, ADJUSTMENT METHOD, EXPOSURE METHOD, DEVICE MANUFACTURING METHOD, AND PROGRAM

摘要

PROBLEM TO BE SOLVED: To provide a method for predicting the transfer characteristic of a pattern via a projection optical system in a short time. SOLUTION: A change in the imaged state of the transfer image of a pattern according to a defocus is regarded as a change in the wave front aberration of the projection optical system. In a step 108, respective focus dependency aberration components (Z4, Z9, Z16, Z25, Z36) are corrected. In a step 112, the value of linear coupling of aberration components (Z1-Z37) including the corrected focus dependency aberration components (Z4, Z9, Z16, Z25, Z36) are calculated, and a changeΔCD in the line width of an image of the pattern is predicted. COPYRIGHT: (C)2004,JPO&NCIPI