发明名称 |
Ion source and ion beam device |
摘要 |
An ion source includes a plasma producing device, an ion deriving electrode having a first grid with a positive potential and a second grid with negative potential for deriving ions from a plasma producing area of the plasma producing device, and a communicating portion communicating the plasma area with an outside thereof for removing an influence of the negative potential of the second grid with respect to electrons from the plasma producing area.
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申请公布号 |
US2004173758(A1) |
申请公布日期 |
2004.09.09 |
申请号 |
US20040788371 |
申请日期 |
2004.03.01 |
申请人 |
SHIMADZU CORPORATION |
发明人 |
SUZUKI MASAYASU;UEDA MASAHIRO;KONISHI YOSHIYUKI |
分类号 |
C23C14/46;C23F4/00;H01J27/00;H01J27/02;H01J37/08;H01J37/305;H01J49/10;(IPC1-7):H01J27/00 |
主分类号 |
C23C14/46 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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