| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a permanent mask resist which exhibits high moisture resistant insulation performance without deteriorating flexibility, solder heat resistance and chemical resistance as the permanent mask resist, and to provide a manufacture method of the permanent mask resist and a permanent mask resist laminate substrate. <P>SOLUTION: The permanent mask resist has a group expressed by ordinary formula (I), wherein X denotes metal ion of n-valence and n is valence number of the metal ion. In the manufacture method of the permanent mask resist, the layer of photosensitive resin composition on the substrate is irradiated with active light and, thereafter, is washed and developed with washing aqueous solution and developer which are made by mixing or dissolving metal ion. <P>COPYRIGHT: (C)2004,JPO&NCIPI |
