| 摘要 |
PROBLEM TO BE SOLVED: To provide a reflective projection optical system capable of attaining a six-mirror system constituted so that it is applicable to EUV lithography, it has a high NA, and also, the maximum effective diameter of the mirror and the whole length of the optical system are made small and it has an improved image forming performance, and to provide an exposing device and a method for manufacturing the device. SOLUTION: As for the reflective projection optical system for projecting a reduced size of a pattern on an object surface onto an image plane, the 3rd mirror and the 4th mirror from the image plane along the optical path are located between the 1st mirror from the image plane along the optical path and the 2nd mirror from the image plane along the optical path. COPYRIGHT: (C)2004,JPO&NCIPI
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