| 摘要 |
The present invention provides the development of techniques for development and removal of a resist in place of conventional chemicals, and the techniques to present pollution-free treatment of discharged water involved in this removal technique. Namely, the removal of an uncured resist after exposure of a board 40 is conducted by preferably immersing the board in a sodium carbonate solution tank 42, and then using an electrolyzed alkaline water by a showering apparatus 44, etc.; and the removal of a cured resist after etching is conducted by preferably swelling the cured resist by means of a sodium hydroxide solution and then using an electrolyzed alkaline water. Further, to a resist discharged water containing resist residues removed from the board 40 by means of the electrolyzed alkaline water, the electrolyzed acidic water is mixed to acidify the discharged water to a neutral to weekly acidic range, and then the resist residues are collected and recovered by means of a filter.
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