发明名称 Exposure apparatus and method of producing device
摘要 To solve the problem, when the inside of an exposure apparatus is placed under vacuum, of a gas being emitted from a resin tube provided in the exposure apparatus, and a component of the gas adhering to and being deposited on the surface of an optical element, so that the optical performances of the optical element and the exposure apparatus are deteriorated, the exposure apparatus is provided with means for controlling the surface temperature of the resin tube in the exposure apparatus up to a predetermined temperature.
申请公布号 US2004174505(A1) 申请公布日期 2004.09.09
申请号 US20040785252 申请日期 2004.02.23
申请人 CANON KABUSHIKI KAISHA 发明人 TERASHIMA SHIGERU
分类号 G03F7/20;H01L21/027;(IPC1-7):G03B27/52 主分类号 G03F7/20
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