发明名称 POLISHING DEVICE, POLISHING METHOD, AND METHOD FOR MANUFACTURING SUBSTRATE FOR MASK BLANK
摘要 <P>PROBLEM TO BE SOLVED: To prevent a polishing powder from agglomerating and solidifying on a sun gear to inhibit the occurrence of the defect due to the agglomerated and solidified polishing powder in a planet gear type polishing device. <P>SOLUTION: In the polishing method, one surface or both surfaces of an article W to be polished are polished by using the polishing device, which is equipped with: a carrier 50 supporting the article W to be polished, meshing with the sun gear 30 and an internal gear 40, and rotating and revolving responding to the rotation of the sun gear 30 or the internal gear 40; an upper polishing plate 20 and a lower polishing plate 10 for holding the article W to be polished held by the carrier 50 from above and under; and polishing liquid supplying unit 60 supplying a polishing liquid between upper surface plate 20 and lower surface plate 20. The device further has a dryness preventing liquid supplying unit 70 for supplying a dryness preventing liquid on the upper portion of the sun gear 30, and the article W to be polished is polished while supplying the dryness preventing liquid on the upper portion of the sun gear 30 from the dryness preventing liquid supplying unit 70. <P>COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004249444(A) 申请公布日期 2004.09.09
申请号 JP20030045001 申请日期 2003.02.21
申请人 HOYA CORP 发明人 AKAGAWA HIROYUKI
分类号 B24B55/06;B24B37/04;H01L21/304 主分类号 B24B55/06
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