| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a base-increasing silicon compound; to provide a base-increasing siloxane resin obtained by dehydrating condensation of the silicon compound, which produces a base by the action of a base; and to provide a photosensitive resin composition composed of the siloxane resin. <P>SOLUTION: The photosensitive composition is composed of the siloxane resin consisting of a base-increasing unit which produces a base by the action of a base and is expressed by formula (1) (in the formula R<SB>1</SB>is a 1-6C alkyl or alkoxy group; R<SB>2</SB>is a bivalent organic residue; R<SB>3</SB>and R<SB>4</SB>are each a hydrogen atom or a methyl group; R<SB>5</SB>and R<SB>6</SB>are substituents wherein the sum of both Hammett substituent constants σm is +0.01 to +0.7), and a unit expressed by formula (2) (in the formula R<SB>1</SB>has the same meaning as the above; and R<SB>7</SB>is a 1-6C alkyl or alkoxy group, or a phenyl group). <P>COPYRIGHT: (C)2004,JPO&NCIPI |
