| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To carry out an appropriate real-time focus correction with considerably easy and simultaneous judgment on both focus offset rate and focus offset direction in manufacturing a semiconductor device. <P>SOLUTION: A substrate 21 is provided with two windows 22, 23 for forming exposure patterns, and phase shifters 25, 26 formed around the windows 22, 23, respectively. Phase differences individually caused by the phase shifters 25, 26 are preset in such a way that a difference A3 between variation curves A1, A2 of two pattern dimensions, which are obtained in forming the individual exposure patterns on a semiconductor wafer with light passing through the windows 22, 23 while gradually offsetting focuses, results in a value that shows variation characteristics of simple increase or decrease with respect to the focus offsets. <P>COPYRIGHT: (C)2004,JPO&NCIPI</p> |
