发明名称 Interferometer, exposure apparatus and method for manufacturing device
摘要 A method for measuring aberration of an optical system that constitutes an interferometer comprises a step of disposing a reflecting member at an image point of the optical system and a step of detecting, by detection means, interference fringes formed based on light that has been emitted from a light source, transmitted through the optical system, caused to illuminate the reflecting member, reflected by the reflecting member and transmitted through the optical system again. The refractive index of the reflecting member with respect to the light is equal to or larger than 1.8.
申请公布号 US2004174534(A1) 申请公布日期 2004.09.09
申请号 US20040793510 申请日期 2004.03.03
申请人 AOKI EIJI 发明人 AOKI EIJI
分类号 G01B9/02;G01J9/02;G01M11/02;G03F7/20;H01L21/027;(IPC1-7):G01B9/02 主分类号 G01B9/02
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