发明名称 METHOD FOR SPECIFYING DEFECTIVE PROCESS
摘要 PROBLEM TO BE SOLVED: To provide a method for easily specifying a process/device causing problems in a process for manufacturing a thin film device. SOLUTION: A defective-process specifying system 110 in a process for manufacturing a semiconductor wafer has the steps of inputting inspection information from inline inspecting devices 102a, 102b, automatically detecting an abnormality by use of defective position information or external information, downloading and analyzing required information such as device evaluation information 106, product inspection information 107, manufacturing route information 108 from an upper data base 105 for abnormality, and specifying the defective process/device. This automatically detects the abnormality triggered by an input of inline inspection information, and downloads and analyzes the required information from the upper data base 105, which allows an operator not to select an analysis objective, and the defective process/device can be easily specified. COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004253603(A) 申请公布日期 2004.09.09
申请号 JP20030042182 申请日期 2003.02.20
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 SHIBUYA HISAE;TAKAGI YUJI;HOSOYA NAOKI;OBARA KENJI
分类号 G01N21/956;H01L21/02;H01L21/66;(IPC1-7):H01L21/66 主分类号 G01N21/956
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