发明名称 |
MICROPATTERNING OF MOLECULAR SURFACES VIA SELECTIVE IRRADIATION |
摘要 |
A method for surface micropatterning includes forming on a surface containing a first polymer a first coating containing a second polymer having first functionalities capable of being converted to second functionalities by exposure to an acid. A second coating containing a photoacid generator is formed on the first coating. The second coating containing the photoacid generator is selectively irradiated in one or more regions thereof with radiation having a spatially varying internsity pattern to generate an acid in each irradiated region of the second coating. The acid converts the first functionalities of each region of the second polymer underlying a respective irradiated region of the second coating to second functionalities. A first molecular patterned surface having one or more regions of the first functionalities and one or more regions of the second functionalities is formed. |
申请公布号 |
AU2003210997(A1) |
申请公布日期 |
2004.09.09 |
申请号 |
AU20030210997 |
申请日期 |
2003.02.13 |
申请人 |
THE TRUSTEES OF COLUMBIA UNIVERSITY IN THE CITY OF NEW YORK |
发明人 |
KWANGJOO LEE;PENG WANG;JEFFREY, T. KOBERSTEIN;FENG PAN |
分类号 |
B05D3/00;G03F7/00;G03F7/095;G03F7/16;(IPC1-7):G03F7/00;B32B31/00 |
主分类号 |
B05D3/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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