发明名称 |
FILM DEPOSITING METHOD |
摘要 |
PROBLEM TO BE SOLVED: To provide a method for uniformly and easily depositing a film having a diffusion-blocking layer on an interface with a base material at low cost. SOLUTION: In the film depositing method, a film comprising a diffusion-blocking layer 3 and a coating layer 4 on a base material 1 is deposited on the surface of the base material 1. The method includes a preliminary oxidizing step of oxidizing the base material 1 to form a base material oxide layer 2, and a coating step of depositing a film comprising the diffusion-blocking layer 3 and the coating layer 4 by coating the surface of the base material with a coating material including at least one alloy or compound containing an element to generate oxide of the generation enthalpy lower than that of oxide of the base material oxide layer 2. COPYRIGHT: (C)2004,JPO&NCIPI
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申请公布号 |
JP2004250788(A) |
申请公布日期 |
2004.09.09 |
申请号 |
JP20040022125 |
申请日期 |
2004.01.29 |
申请人 |
NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL & TECHNOLOGY |
发明人 |
TAWARA TATSUO;SHOBU KAZUHISA;HIRAI HISATOSHI;SAKAMOTO MITSURU |
分类号 |
F01D5/28;B22F7/04;C22C27/02;C22C27/04;C23C4/02;C23C4/08;C23C28/00;F02C7/00;(IPC1-7):B22F7/04 |
主分类号 |
F01D5/28 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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