| 摘要 |
A system for removing photoresist and providing in-situ discharge. A resist stripper system includes a vertical downstream chamber, a gas passageway at the top of the vertical downstream chamber to supply an inert gas, and a wafer plate at the bottom inside the vertical downstream chamber to support and fix a wafer. A plasma generating system on the vertical downstream chamber near the gas passageway induces plasma of an inert gas. A first gas outlet on the vertical downstream chamber between the wafer plate and the plasma generating system exhausts the plasma, and a second gas outlet on the vertical downstream chamber beneath the wafer plate exhausts resist residue. A power supply is connected to the wafer plate to apply a positive bias to the wafer to attract electrons.
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