| 摘要 |
In a method for building high aspect ratio electrodes in an electrode means (E) comprising parallel electrodes ( epsilon >1<, epsilon >2<) in a dense arrangement, the electrodes are built in a repeatedly performed sequence of successive process steps involving the use of only one and the same photomask in every patterning step, the electrodes being formed with a desired aspect ratio according to the number of times the sequence is repeated, and top surface of the electrode means planarized in a final process step. |
