发明名称 |
Glass-processing method and glass-processing apparatus for the method |
摘要 |
<p>A glass-processing method adjusts the range of the heating region according to the work piece and processing condition, and a glass-processing apparatus implements the method. The method incorporates the heating of a glass body (G) with a thermal plasma torch (10) comprising (a) a main body provided with a plurality of ports (P1,P2,P3) from which a gas issues and (b) a device (8) for applying a high-frequency electric field to the gas fed into the main body. The method comprises the steps of (1) adjusting the plasma flame's size perpendicular to the center axis of the main body by controlling the flow rate of the gas fed into each port according to the size of the glass body, the processing condition, or both and (2) heating the glass body. The apparatus comprises (a) a thermal plasma torch (10) for heating a glass body, comprising (a1) a main body provided with a plurality of ports (P1,P2,P3) from which a gas issues and (a2) a device (8) for applying a high-frequency electric field to the gas fed into the main body and (b) a device (31,32) for adjusting the flow rate of the gas fed into each port.</p> |
申请公布号 |
EP1454889(A1) |
申请公布日期 |
2004.09.08 |
申请号 |
EP20040004489 |
申请日期 |
2004.02.27 |
申请人 |
SUMITOMO ELECTRIC INDUSTRIES, LTD |
发明人 |
ONISHI, MASASHI;HIRANO, MASAAKI;NAKANISHI, TETSUYA |
分类号 |
C03B23/043;C03B23/207;C03B29/02;C03B37/012;C03B37/018;H05H1/30;(IPC1-7):C03B37/018 |
主分类号 |
C03B23/043 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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