发明名称 |
Solid-state imaging device, method for manufacturing the same and interline transfer CCD image sensor |
摘要 |
A high-performance solid-state imaging device is provided. The solid-state imaging device includes: a plurality of pixel cells; and a driving unit. Each of the plurality of pixel cells includes: a photodiode (3) that converts incident light into a signal charge and stores the signal charge; a MOS transistor (4) that is provided for reading out the signal charge stored in the photodiode (3); an element isolation portion (2) that is formed of a STI that is a grooved portion of the semiconductor substrate (10) so that the photodiode (3) and the MOS transistor (4) are isolated from each other; and a deep-portion isolation implantation layer (1) that is formed under the element isolation portion (2) for preventing a flow of a charge from the photodiode (3) to the MOS transistor (4).
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申请公布号 |
EP1455389(A2) |
申请公布日期 |
2004.09.08 |
申请号 |
EP20040002910 |
申请日期 |
2004.02.10 |
申请人 |
PANASONIC CORPORATION |
发明人 |
NAGASAKI, HIROKI;TANAKA, SYOUJI;MATSUNAGA, YOSHIYUKI |
分类号 |
H01L27/146;H01L21/76;H01L21/762;H01L27/148;H01L31/10;H04N5/335;H04N5/369;H04N5/3728;H04N5/374;(IPC1-7):H01L21/762 |
主分类号 |
H01L27/146 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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