发明名称 Method of forming and adjusting optical system and exposure apparatus, and for determining specification thereof and related computer system
摘要 A computer system comprises a first computer into which target information that an optical apparatus is to achieve is inputted and a second computer that determines the specification of a projection optical system based on the target information received from the first computer via a communication path with using a wave-front aberration amount, which the projection optical system is to satisfy, as a standard. Therefore, in the process of making the projection optical system, higher-order components of the aberration as well as lower-order components can be simultaneously corrected by adjusting the projection optical system based on the result of measuring the wave-front aberration to satisfy the specification, so that the making process becomes simpler. Furthermore, the target that the exposure apparatus is to achieve is securely achieved due to the projection optical system. <IMAGE>
申请公布号 EP1231516(A3) 申请公布日期 2004.09.08
申请号 EP20020250904 申请日期 2002.02.11
申请人 NIKON CORPORATION 发明人 HAMATANI, MASATO;TSUKAKOSHI, TOSHIO
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
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