| 摘要 |
Apparatus for treating exhaust gases containing hydrogen from a semiconductor manufacturing line,' chemical plant or the like, which apparatus comprises aspirating means (7,16) for aspirating exhaust gases (G) containing hydrogen from a discharge source of said exhaust gases; mixing means (7,16) for mixing the aspirated exhaust gases with oxygen or air; reacting means (5) for reacting the mixed hydrogen and oxygen or air to form water, which reacting means comprises catalytic means (5h) for generating oxygen and hydrogen free radicals from oxygen and said exhaust gases respectively, which oxygen and hydrogen free radicals react to form water; and condensing means (9) for condensing water formed in the reactor. A second reacting means (6) may be provided for reacting un-reacted hydrogen and oxygen discharged from the first-mentioned reactor means to form water. <IMAGE> |
