| 摘要 |
Atomic lithography for depositing atoms on a substrate is carried out by forming an atomic beam, and directing it toward a substrate, and providing converging laser beams above a surface of the substrate, wherein the laser beams are modulated by at least one spatial light modulator through which the laser beam passes to form at least one high intensity optical spot by interference to selectively focus the atomic beam. The optical spot and focused atomic beam can be translated in a selected pattern by appropriate control of the individual pixel elements in the spatial light modulator. An atomic lithography system that can be configured to form arbitrary two-dimensional nanostructures on a substrate may include at least one spatial light modulator and lenses positioned adjacent the at least one spatial light modulator. The lenses and the at least one spatial light modulator are configured to selectively form a high intensity optical spot to focus atoms from an atomic beam onto the substrate.
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