发明名称 Method of replacing at least a portion of semiconductor substrate deposition process kit hardware, and method of depositing materials over a plurality of semiconductor substrates
摘要 The invention includes an engagement mechanism for semiconductor substrate deposition process kit hardware, including a body having a distal portion and a proximal portion. The body is sized for movement through a passageway of a semiconductor substrate deposition chamber through which semiconductor substrates pass into and out of the chamber for deposition processing. At least the engager is mounted to the distal portion of the body. The engager is sized for movement through said passageway with the body. The engager is configured to releasably engage a component of process kit hardware received within said chamber. The invention includes methods of replacing at least a portion of semiconductor substrate deposition process kit hardware. The invention includes methods of depositing materials over a plurality of semiconductor substrates. Other implementations are contemplated.
申请公布号 US6787373(B2) 申请公布日期 2004.09.07
申请号 US20030396268 申请日期 2003.03.24
申请人 MICRON TECHNOLOGY, INC. 发明人 DANDO ROSS S.;CARPENTER CRAIG M.;CAMPBELL PHILIP H.;MARDIAN ALLEN P.;SANDHU GURTEJ S.
分类号 C23C16/44;C23C16/54;(IPC1-7):H01L21/00 主分类号 C23C16/44
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