发明名称 |
Method for manufacturing MTJ cell of magnetic random access memory |
摘要 |
The present invention discloses methods for manufacturing MTJ cell of MRAM wherein two annealing process with different magnitudes of applied magnetic fields are performed. In accordance with the method, the formation process of second pinned magnetic layer comprises a first annealing process and a second annealing process, wherein a magnitude of a magnetic field applied during the first annealing process being larger than that of a magnetic field applied during the second annealing process.
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申请公布号 |
US6787372(B1) |
申请公布日期 |
2004.09.07 |
申请号 |
US20030731162 |
申请日期 |
2003.12.10 |
申请人 |
HYNIX SEMICONDUCTOR, INC. |
发明人 |
LEE KYE NAM;JANG IN WOO;PARK YOUNG JIN |
分类号 |
H01L27/105;G11C11/15;H01F10/32;H01F41/30;H01L21/8246;H01L43/08;H01L43/12;(IPC1-7):H01G21/00 |
主分类号 |
H01L27/105 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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