发明名称 Stage unit and exposure apparatus
摘要 A plurality of fiducial mark plates, on which a plurality of fiducial marks are dispersedly arranged by each measurement sequence which uses the fiducial mark, are arranged on the periphery of a substrate holder on the substrate stage so as to make the positional relationship between the substrate holder constant. This allows the fiducial mark plates to be arranged on the substrate stage at a place where there is little space. In addition, the main controller performs various measurement sequences that include the detection operation to detect the positional information on each fiducial mark using the mark detection system. Accordingly, it becomes possible to downsize the substrate stage, which leads to a reduction in footprint, while maintaining the measurement functions.
申请公布号 US6788393(B2) 申请公布日期 2004.09.07
申请号 US20010995595 申请日期 2001.11.29
申请人 NIKON CORPORATION 发明人 INOUE JIRO
分类号 G03F7/22;G03B27/42;G03F7/20;H01L21/027;H01L21/68;(IPC1-7):G03B27/58;G01B11/00 主分类号 G03F7/22
代理机构 代理人
主权项
地址