发明名称 Fabrication method of semiconductor integrated circuit device
摘要 To reduce the manufacturing time in a production line for a semiconductor integrated circuit device, plural wafers in a lot are divided into a number of groups according to a selected number of manufacturing devices to be used for further processing of the wafers. Each group of wafers is allocated to a respective one of plural manufacturing devices in a state in which each group is housed in a respective one of plural division carriers and one sheet processing is applied to the wafer groups in the plural manufacturing devices in parallel.
申请公布号 US6788996(B2) 申请公布日期 2004.09.07
申请号 US20020091478 申请日期 2002.03.07
申请人 RENESAS TECHNOLOGY CORP. 发明人 SHIMIZU MICHIYUKI
分类号 H01L21/677;G05B19/418;H01L21/02;(IPC1-7):G06F7/00;G06F19/00 主分类号 H01L21/677
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