发明名称 Apparatus for determining doping concentration of a semiconductor wafer
摘要 An apparatus for measuring at least one electrical property of a semiconductor wafer includes a probe including a shaft having at a distal end thereof a conductive tip for electrically communicating with an object area of the semiconductor wafer. The apparatus further includes a device for applying an electrical stimulus between the conductive tip and the object area, and a device for measuring a response of the semiconductor wafer to the electrical stimulus and for determining from the response the at least one electrical property of the object area of the semiconductor wafer. A probe guard is included and surrounds the shaft of the probe adjacent the distal end of the probe. The probe guard also insulates the conductive tip from the semiconductor wafer.
申请公布号 US6788076(B2) 申请公布日期 2004.09.07
申请号 US20030616641 申请日期 2003.07.09
申请人 SOLID STATE MEASUREMENTS, INC. 发明人 HOWLAND WILLIAM H.
分类号 H01L21/66;G01N27/00;G01R27/08;G01R31/08;G01R31/26;H01L21/44;(IPC1-7):G01R27/08 主分类号 H01L21/66
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