发明名称 |
Apparatus for determining doping concentration of a semiconductor wafer |
摘要 |
An apparatus for measuring at least one electrical property of a semiconductor wafer includes a probe including a shaft having at a distal end thereof a conductive tip for electrically communicating with an object area of the semiconductor wafer. The apparatus further includes a device for applying an electrical stimulus between the conductive tip and the object area, and a device for measuring a response of the semiconductor wafer to the electrical stimulus and for determining from the response the at least one electrical property of the object area of the semiconductor wafer. A probe guard is included and surrounds the shaft of the probe adjacent the distal end of the probe. The probe guard also insulates the conductive tip from the semiconductor wafer.
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申请公布号 |
US6788076(B2) |
申请公布日期 |
2004.09.07 |
申请号 |
US20030616641 |
申请日期 |
2003.07.09 |
申请人 |
SOLID STATE MEASUREMENTS, INC. |
发明人 |
HOWLAND WILLIAM H. |
分类号 |
H01L21/66;G01N27/00;G01R27/08;G01R31/08;G01R31/26;H01L21/44;(IPC1-7):G01R27/08 |
主分类号 |
H01L21/66 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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