发明名称 Test key for detecting overlap between active area and deep trench capacitor of a DRAM and detection method thereof
摘要 A test key disposed on a scribe line of a wafer. The test key includes: two active areas disposed on the substrate; two first deep trench capacitors disposed on the substrate outside the two active areas; a rectangular active word line disposed on the substrate covering the first deep trench capacitors and the active areas; first and second passing word lines disposed on one side of the rectangular active word line and across the parallel active areas; a third passing word line disposed on another side of the rectangular active word line and across another end of the two active areas; two second deep trench capacitors disposed on the substrate under where the two first passing word lines overlap the two active areas; and four contacts disposed on the first active areas between the first and second word lines and between the third and the rectangular active word line.
申请公布号 US6788598(B2) 申请公布日期 2004.09.07
申请号 US20030448661 申请日期 2003.05.30
申请人 NANYA TECHNOLOGY CORPORATION 发明人 CHANG MING-CHENG;WU TIE-JIANG;LIN JENG-PING;KUO TSE-MAIN;FAN HSU-CHENG
分类号 G11C29/50;H01L21/334;H01L21/8242;H01L23/544;H01L27/02;(IPC1-7):G11C7/00 主分类号 G11C29/50
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