发明名称 Equipment for fabricating a semiconductor product
摘要 A semiconductor fabricating device and method that minimize the influence of a process deteriorating material that is generated during first processes on second processes, when the plurality of processes are continually performed step by step. Operational failures are prevented during the course of the semiconductor fabricating processes, by directing air flow from a location where the second processes are carried out to a location where the first processes are carried out, to carry the process deteriorating gas away from the second processes. This reduces the frequency of failures during processing.
申请公布号 US6786970(B2) 申请公布日期 2004.09.07
申请号 US20010939556 申请日期 2001.08.28
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 OH HYUN-DON;PARK TAE-SIN
分类号 H01L21/027;G03F7/20;H01L21/00;(IPC1-7):B05C11/00;B65G49/07 主分类号 H01L21/027
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