发明名称 |
PAD CONDITIONER FOR CMP EQUIPMENT FOR STABLE CONDITIONING PROCESS |
摘要 |
PURPOSE: A pad conditioner for CMP equipment is provided to perform stably a conditioning process by lengthening a lifetime and widening a pressure transmission range. CONSTITUTION: A disk holder includes a polishing disk and is tangent to a surface of a polishing pad. A conditioner head includes a driver. The disk holder is coupled to the driver. The driver is used for driving the disk holder. The disk holder includes a driving sleeve part and a disk-shaped flexure(164). The driving sleeve part is coupled to the conditioner head in order to receive the driving force and the pressure. The disk-shaped flexure is coupled to the driving sleeve part in order to receive the uniform pressure.
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申请公布号 |
KR20040077009(A) |
申请公布日期 |
2004.09.04 |
申请号 |
KR20030012374 |
申请日期 |
2003.02.27 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
JUN, DONG GEUN;KIM, JONG HAK |
分类号 |
H01L21/304;(IPC1-7):H01L21/304 |
主分类号 |
H01L21/304 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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