LITHOGRAPHY PROCESS INSPECTION SYSTEM USING SCANNING ELECTRON MICROSCOPE AND OPTICAL MICROSCOPE TO CHECK UPPER AREA OF WAFER

摘要

PURPOSE: A lithography process inspection system using a scanning electron microscope and an optical microscope is provided to obtain a profile from an upper region of a wafer and reduce a period of an inspection process by using a plurality of reflectors for inspecting an upper region of a wafer. CONSTITUTION: A lithography process inspection system includes a scanning electron microscope and an optical microscope in order to inspect a profile of a wafer(30) after a lithographic process. The optical microscope(10) includes a plurality of reflectors(40,42,44) in order to obtain the profile from an upper region of the wafer. The reflectors are installed at a predetermined position in order to cross the beam of the optical microscope and the beam of the scanning electron microscope.