MICRO COLUMN AND METHOD FOR MANUFACTURING THE SAME CAPABLE OF REMOVING COMPLEX ETCHING PROCESS

摘要

PURPOSE: A micro column and a method for manufacturing the same are provided to make the thickness of the micro column constant and remove a complex etching process. CONSTITUTION: A micro column comprises a plurality of micro lenses for controlling electron beams or ion beams. The micro lenses include a conductive sheet(101) having holes and a glass plate(103) having holes contacted to the bottom or top surface of the conductive sheet. The conductive sheet is a metal thin film or a semiconductor substrate having doped impurity. The hole of the glass plate is larger than the hole of the conductive sheet.