发明名称 Method for producing polymer-free area on a substrate
摘要 The invention relates to a method for producing a polymer-free area, characterized by applying at least one peelable layer to the substrate, and/or to one or more polymer layer(s) situated on the substrate, in those areas where a polymer-free area is formed on the substrate by removing the peelable layer. The invention thus provides a method for producing polymer-free bonding areas or, by placing a diode-protecting cap on the polymer-free area of the substrate, a hermetically sealed connection between the substrate and the diode-protecting cap.
申请公布号 US2004171255(A1) 申请公布日期 2004.09.02
申请号 US20030481848 申请日期 2003.12.22
申请人 ROTH WOLFGANG 发明人 ROTH WOLFGANG
分类号 H05B33/10;H01L51/40;H01L51/50;H01L51/52;H01L51/56;H05B33/04;(IPC1-7):H01L21/302;H01L21/461 主分类号 H05B33/10
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