| 发明名称 |
Method for coating photoresist on a substrate |
| 摘要 |
A method for coating photoresist (300) on a substrate (100) includes the steps of forming grooves (120) on the substrate, applying photoresist onto the substrate, and finally vibrating the substrate. The photoresist can be coated on the substrate evenly, and the efficiency of utilization of the photoresist is high.
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| 申请公布号 |
US2004170764(A1) |
申请公布日期 |
2004.09.02 |
| 申请号 |
US20040789706 |
申请日期 |
2004.02.27 |
| 申请人 |
CHEN YUNG-CHANG;PANG JIA-PANG;LAI CHIEN-TING |
发明人 |
CHEN YUNG-CHANG;PANG JIA-PANG;LAI CHIEN-TING |
| 分类号 |
G03F7/16;(IPC1-7):B05D5/12;B05D3/12 |
主分类号 |
G03F7/16 |
| 代理机构 |
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代理人 |
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| 主权项 |
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