Verfahren und Vorrichtung zur sequentiellen Plasmabehandlung,申请号DE20016001209T-传众专利搜索

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发明名称	Verfahren und Vorrichtung zur sequentiellen Plasmabehandlung
摘要
申请公布号	DE60101209(T2)	申请公布日期	2004.09.02
申请号	DE20016001209T	申请日期	2001.04.27
申请人	EUROPEAN COMMUNITY, BRUESSEL/ BRUXELLES	发明人	COLPO, PASCAL;ROSSI, FRANCOIS
分类号	H05H1/24;A61J1/10;A61M25/00;B01J19/08;C23C16/515;H01J37/32;H05H1/46;(IPC1-7):C23C16/04	主分类号	H05H1/24
代理机构		代理人
主权项
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