发明名称 QUANTUM SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a quantum semiconductor device and a method of manufacturing the same device in which the electrical access to the quantum dot is made accurately. <P>SOLUTION: The quantum semiconductor device comprises a quantum dot 12 formed over a semiconductor substrate 10, a semiconductor layer 18 formed to embed the quantum dot 12, and an electrode 22 formed at the area over the quantum dot 12 over the surface of the semiconductor layer 18 due to a stress generated to the semiconductor layer 18 because of existence the quantum dot 12. Accordingly, electrical access is made accurately to the quantum dot 12, and moreover independent electrical access is also made to the quantum dot 12. <P>COPYRIGHT: (C)2004,JPO&NCIPI</p>
申请公布号 JP2004247431(A) 申请公布日期 2004.09.02
申请号 JP20030034245 申请日期 2003.02.12
申请人 FUJITSU LTD 发明人 SO KAICHI
分类号 H01L21/28;H01L21/285;H01L29/06;(IPC1-7):H01L29/06 主分类号 H01L21/28
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