Amorphous and polycrystalline silicon nanolaminate

摘要

A method for forming a uniform layered structure comprising an ultra-thin layer of amorphous silicon and its thermal oxide is disclosed. In one aspect, a method for forming a nanolaminate of silicon oxide on a substrate is disclosed. In another aspect, a method for forming a patterned hard mask on a substrate is disclosed. The patterned hard mask includes a nanolaminate of silicon and silicon oxide. The methods are characterized by the oxidation of an amorphous silicon layer using atomic oxygen.