EXPOSURE METHOD, ALIGNER AND ILLUMINATION APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide an exposure method capable of improving the accuracy of a pattern edge. SOLUTION: The luminous flux L from a light source 2 irradiates a photomask 9 through an integrator lens 6 to expose stripe patterns on a sustrate like color filter 100. The cross section of the flux L passing the integrator lens 6 is made in an anisotropic form having a larger length in the longitudinal direction of the stripe pattern to expose the color filter 100. COPYRIGHT: (C)2004,JPO&NCIPI