HALOGENATED OXIME DERIVATIVES AND THE USE THEREOF AS LATENT ACIDS

摘要

Compounds of the formula (I) or (II) wherein R1 is C1-C10haloalkylsulfonyl, halobenzenesulfonyl, C2-C10haloalkanoyl, halobenzoyl; R2 is halogen or C1- C10haloalkyl; Arl is phenyl, biphenylyl, fluorenyl, naphthyl, anthracyl, phenanthryl, or heteroaryl, all of which are optionally substituted; Ar'1 is for example phenylene, naphthylene, diphonylene, heteroarylene, oxydiphenylene, phenyleneD-D1-D-phenylene or -A r'1-A1-Y1-A1-A r'1-; wherein these radicals optionally are substituted; Ae', is phenylene, naphthylene, anthracylene, phenanthrylene, or heteroarylene, all optionally substituted; A, is for exampfe a direct bond, -0-, -S-, or -NR6-; Y, inter alia is C1- C18alkylene; X is halogen; D is for example -0-, -S- or -NR6-; D, inter alia is C1-C18alkylene; are particularly suitable as photolatent acids in ArF resist technology.