发明名称 IN-LINE TYPE PROCESSING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide an in-line type processing apparatus for a substrate (glass substrate), which keeps the substrate uniformly at a prescribed temperature in a short period of time. SOLUTION: A temperature regulating means 3 is arranged below a transfer line composed of a large number of continuous rollers 2. The temperature regulation means 3 is composed of two temperature regulating solution spouting nozzles 4 each arranged between the continuous rollers 2 and a chiller 5 which feeds liquid (developing solution or water) whose temperature is controlled to the nozzles 4. A slit for spouting a temperature regulating solution against the rear surface of the glass substrate W is provided to the top surface of the temperature regulating solution spouting nozzle 4, and the length of the slit is set nearly equal to the width of the glass substrate W. COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004247335(A) 申请公布日期 2004.09.02
申请号 JP20030032454 申请日期 2003.02.10
申请人 TOKYO OHKA KOGYO CO LTD 发明人 SHIMAI FUTOSHI;KAWADA SHIGERU
分类号 G03F7/20;B65G13/02;B65G39/04;B65G49/06;H01L21/02;H01L21/027;H01L21/677;H01L21/68;(IPC1-7):H01L21/68 主分类号 G03F7/20
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