发明名称 |
Asymmetric Group 8 (VIII) metallocene compounds |
摘要 |
Asymmetric, disubstituted metallocene compounds have the general formula CpMCp' where M is a metal selected from the group consisting of Ru, Os and Fe; Cp is a first substituted cyclopentadienyl or indenyl moiety that includes at least one substituent group D1; Cp' is a second substituted cyclopentadienyl or indenyl moiety that includes at least one substituent group D1'. D1 is different from D1'. D1 is X; Ca1Hb1Xc1; Ca2Hb2Xc2(C=O)Ca1Hb1Xc1; or Ca2Hb2Xc2OCa1Hb1Xc1, where X is a halogen atom or nitro group; a1 is an integer between 2 and 8; b1 is an integer between 0 and 2(a1)+1-c1; c1 is an integer between 0 and 2(a1)+1-b1; b1+c1 is at least 1; a2 is an integer between 0 and 8; b2 is an integer between 0 and 2(a2)+1-c2; and c2 is an integer between 0 and 2(a2)+1-b2; and D1' is X; Ca1Hb1Xc1; Ca2Hb2Xc2(C=O)Ca1Hb1Xc1; or Ca2Hb2Xc2OCa1Hb1Xc1, where X is a halogen atom or nitro group; a1 is an integer between 1 and 8; b1 is an integer between 0 and 2(a2)+1-cl; c1 is an integer between 0 and 2(a1)+1-b1; b1+c1 is at least 1; a2 is an integer between 0 and 8; b2 is an integer between 0 and 2(a2)+1-c2; and c2 is an integer between 0 and 2(a2)+1-b2. The compounds can be employed as precursors in film deposition processes.
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申请公布号 |
US2004171858(A1) |
申请公布日期 |
2004.09.02 |
申请号 |
US20030686254 |
申请日期 |
2003.10.16 |
申请人 |
THOMPSON DAVID M.;HOOVER CYNTHIA A. |
发明人 |
THOMPSON DAVID M.;HOOVER CYNTHIA A. |
分类号 |
C23C16/18;C23C16/40;(IPC1-7):C07F17/02 |
主分类号 |
C23C16/18 |
代理机构 |
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代理人 |
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地址 |
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