发明名称 |
Positive imageable thick film compositions |
摘要 |
This invention provides compositions that can be used as positive imageable photoresists. These compositions include positive imageable photopolymer systems and particulate materials. These compositions can be used in thick film and other processes to make films and patterned structures that are useful in producing electronic devices.
|
申请公布号 |
US2004170925(A1) |
申请公布日期 |
2004.09.02 |
申请号 |
US20030728210 |
申请日期 |
2003.12.04 |
申请人 |
ROACH DAVID HERBERT;KIM YOUNG H.;CHENG LAP-TAK ANDREW |
发明人 |
ROACH DAVID HERBERT;KIM YOUNG H.;CHENG LAP-TAK ANDREW |
分类号 |
G03F7/004;G03F7/023;G03F7/039;(IPC1-7):G03F7/004;G03F7/32 |
主分类号 |
G03F7/004 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|