| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive resist composition having wide exposure latitude. <P>SOLUTION: The positive resist composition contains: (A) a compound which generates an acid by irradiation of active rays or radiation; (B) a resin which is insoluble or hardly soluble with an alkali developer solution and becomes soluble with an alkali developer liquid by the effect of an acid; and (C) a compound having a group which reacts with an acid group to bond by the effect of an acid. <P>COPYRIGHT: (C)2004,JPO&NCIPI |
