发明名称 |
PLASMA TREATMENT DEVICE |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a plasma treatment device capable of uniformly and axisymmetrically generating plasma to uniformly and stably process a sample surface. <P>SOLUTION: This plasma treatment device is equipped with: a vacuum treatment vessel 101 made of a conductive material; a sample base 108 installed in the treatment vessel 101 for mounting a sample on the upper surface thereof; an inner tube member 110 made of a dielectric material and disposed so as to cover the inside wall surface of the vacuum vessel 101; and an earthing member 111 for mounting the tube member 110 to the inside wall surface of the treatment vessel 101; and used for applying a plasma treatment to the sample. The earthing member 111 is formed with a projection 111a projecting to the inside of the vessel from the inside wall surface of the vessel 101, and a bent part 111b bent upward from the projection; a deflection preventing member formed of a projecting 201 is formed on the inside wall surface of the vessel 101; and the tube member 110 is mounted in contact with the deflection preventing member on the projecting part. <P>COPYRIGHT: (C)2004,JPO&NCIPI |
申请公布号 |
JP2004247262(A) |
申请公布日期 |
2004.09.02 |
申请号 |
JP20030038741 |
申请日期 |
2003.02.17 |
申请人 |
HITACHI HIGH-TECHNOLOGIES CORP |
发明人 |
AKIYAMA HIROSHI;MAKINO AKITAKA;MATANO KATSUJI;KARASHIMA YOSUKE |
分类号 |
H05H1/46;B01J3/00;B01J19/08;H01L21/3065 |
主分类号 |
H05H1/46 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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