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发明名称
探测方法、探测装置及电极之还原/电浆蚀刻处理机构
摘要
本发明之探测方法具备有:利用成形气体将晶圆W的电极作还原处理的过程、以及在乾燥环境下让电极与探测针14A接触的过程。更且,在被检查体的电极P作还原处理之前,在惰性气体环境下加热被检查体。该还原处理则是藉着在常压下让还原性气体接触到被检查体之电极来实施。
申请公布号
TW200416779
申请公布日期
2004.09.01
申请号
TW092124120
申请日期
2003.09.01
申请人
欧克科技股份有限公司;东京威力科创股份有限公司
发明人
奥村胜弥;小松茂和;阿部佑一;古屋邦浩;文森 维辛;久保谦一
分类号
H01L21/00
主分类号
H01L21/00
代理机构
代理人
林志刚
主权项
地址
日本
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