发明名称 PHASE TRANSITION MEMORY CELL AND FABRICATING METHOD THEREOF TO FORM THIN LOWER ELECTRODE
摘要 PURPOSE: A phase transition memory cell and a fabricating method thereof are provided to reduce the power consumption by forming a thin lower electrode and reducing a contact region. CONSTITUTION: A transistor includes a source region(61s',61s") connected to a source contact, a drain region(61d) connected to a drain contact, and a gate electrode(57a,57b). A variable resistor includes the first electrode, the second electrode, and a phase transition material layer inserted therebetween. The second electrode includes an upper end, a lower end, and a sidewall. The phase transition material layer is used for covering a part of the sidewall of the second electrode. The second electrode is electrically connected to one of the source contact and the drain contact.
申请公布号 KR20040076554(A) 申请公布日期 2004.09.01
申请号 KR20030017237 申请日期 2003.03.19
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 HA, YONG HO;KIM, HYEON JO;LEE, JI HYE
分类号 H01L27/10;H01L27/24;(IPC1-7):H01L27/10 主分类号 H01L27/10
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