发明名称 |
PHASE TRANSITION MEMORY CELL AND FABRICATING METHOD THEREOF TO FORM THIN LOWER ELECTRODE |
摘要 |
PURPOSE: A phase transition memory cell and a fabricating method thereof are provided to reduce the power consumption by forming a thin lower electrode and reducing a contact region. CONSTITUTION: A transistor includes a source region(61s',61s") connected to a source contact, a drain region(61d) connected to a drain contact, and a gate electrode(57a,57b). A variable resistor includes the first electrode, the second electrode, and a phase transition material layer inserted therebetween. The second electrode includes an upper end, a lower end, and a sidewall. The phase transition material layer is used for covering a part of the sidewall of the second electrode. The second electrode is electrically connected to one of the source contact and the drain contact.
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申请公布号 |
KR20040076554(A) |
申请公布日期 |
2004.09.01 |
申请号 |
KR20030017237 |
申请日期 |
2003.03.19 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
HA, YONG HO;KIM, HYEON JO;LEE, JI HYE |
分类号 |
H01L27/10;H01L27/24;(IPC1-7):H01L27/10 |
主分类号 |
H01L27/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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