| 摘要 |
A projection exposure apparatus includes an illumination system (24) for supplying illumination light, a projection optical system (5) for projecting a pattern of a first object (1) onto a second object (9) in cooperation with the illumination light, the projection optical system having a refraction optical element (6,7), a changing system (29-32) for changing a wavelength of the illumination light, a detecting system (19) for detecting a change in pressure, and a control system (23) for controlling the changing system on the basis of an output of the detecting system so as to compensate a change in ratio of refractivity between an atmosphere and the refraction optical element due to a change in pressure. <IMAGE> |
